发明名称 Lithographic apparatus and method
摘要 <p>A substrate carrier arranged to hold a substrate in position is disclosed. The substrate carrier (WC) has a transparent region (2) that extends through the substrate carrier from a side of the substrate carrier on which the substrate is to be held to an opposite side of the substrate carrier, the transparent region being substantially transparent to a signal used to determine the position of an edge of the substrate on the substrate carrier. </p>
申请公布号 EP2037324(A3) 申请公布日期 2010.03.10
申请号 EP20080252915 申请日期 2008.09.02
申请人 ASML NETHERLANDS BV 发明人 VAN DIJK, PAULUS WILHELMUS LEONARDUS;VAN BUEL, HENRICUS WILHELMUS MARIA;KEIJSERS, GERARDUS JOHANNES JOSEPH;ONVLEE, JOHANNES;VAN DEN BROEK, JOHANNES ARIE
分类号 G03F7/20 主分类号 G03F7/20
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