| 摘要 |
The present invention relates to a method of forming a nanopattern, and, more particularly, to a method of continuously forming a nanopattern in a large area and a method of forming a nanopattern on a substrate having a roll shape, and a substrate having a pattern formed using the method. A method of relatively moving a specimen having a large area and a light source of interfering light and a method of performing exposure through the relative axial movement of the light source of interfering light and the substrate having a roll shape while the substrate having a roll shape rotates are used to avoid the problems occurring in the related art, such as a large space required for the equipment during the formation of nanopatterns, a limited output of a laser, and a limited degree of freedom in patterns. |
