发明名称 |
NOVEL POLYMERS, PROCESSES FOR POLYMER SYNTHESIS AND PHOTORESIST COMPOSITIONS |
摘要 |
<p>The invention includes new polymers and methods for providing such polymers and photoresists that comprises the polymers. Methods of the invention include those that comprise providing a reaction mixture and adding over the course of a polymerization reaction one or more polymerization reagents to the reaction mixture to provide the polymer. Photoresists containing a polymer of the invention can exhibit significantly improved lithographic properties.</p> |
申请公布号 |
KR20100025596(A) |
申请公布日期 |
2010.03.09 |
申请号 |
KR20107003751 |
申请日期 |
2002.02.26 |
申请人 |
ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. |
发明人 |
BARCLAY GEORGE G.;CAPORALE STEFAN J.;KAVANAGH ROBERT J.;PUGLIANO NICHOLAS |
分类号 |
G03F7/004;G03F7/033;G03F7/038;G03F7/039;G03F7/26;H01L21/027 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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