| 摘要 |
1,268,941. Ion sources. THOMSON-C.S.F. 8 April, 1969 [9 April, 1968], No. 18006/69. Heading HID. An arrangement for generating a high intensity ion beam comprises a duoplasmatron, a reaction chamber 3 arranged to receive from the duoplasmatron a plasma beam which will expand in the reaction chamber and an arrangement, such as a tube 4, for introducing a gas or vapour into the plasma within the chamber, the reaction products created in the chamber escaping via an exit orifice 5. The duoplasmatron plasma beam may contain hydrogen ions and electrons and the gas or vapour may consist of B, Al, In, P, As, Sb, Li, Hg, O or a hydrocarbon and ions of these materials are created by charge exchange reactions with the hydrogen ions and by ionization by the electrons. The resultant plasma beam may be passed through a magnet 6 to filter out the hydrogen ions (path 8), the useful ions following path 9. If an ion beam rather than a plasma is required a suitably biased electrode cylinder 7 may entract the electrons. The material to be introduced into the plasma beam may be housed in a compartment in the chamber 3 and vaporized using an electric heater element, electron bombardment, or the proximity of the hot plasma beam. A refractory condensation collector may be located opposite the inner end of tube 4 to absorb the kinetic energy of the introduced vapour. |
