发明名称 EXAMINATION APPARATUS
摘要 PURPOSE:To simplify the flow examination of a pattern, by reading designing information from an image memory corresponding to the running direction of the pattern to be inspected to successively input the same to a comparing processing part where the designing information is compared with image information. CONSTITUTION:A data storing part 11 stores the designing data of the pattern formed to the examination region of a reticle. A developing circuit 12 successively reads the designing data corresponding tot he small examination region of the reticle from the storing part 11 to alternately send out the same to image memories 13, 14 and arranges said data in a memory region so as to correspond to the arrangement of each minute part. An address indication circuit 15 alternately reads the data of the small examination region from the memories 13, 14 and changes over a multiplexer 16 to transmit said data to a comparing processing part C. The processing part C compares and discriminates both of the signal from an image information output part B and the signal from a designing information output part A. By this method, the flaw examination of the pattern can be performed by a simple constitution.
申请公布号 JPS62269046(A) 申请公布日期 1987.11.21
申请号 JP19860113128 申请日期 1986.05.17
申请人 NIKON CORP 发明人 TAKEMOTO SHIGERU
分类号 H01L21/66;G01N21/88;G01N21/956;G06K9/00;G06K9/36;G06T1/00;G06T7/00;H01L21/30 主分类号 H01L21/66
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