发明名称 Substrate inspection system including a visual inspection device for inspection by image processing
摘要 A substrate inspection system is formed with an inspection device associated with a reflow process at the end of a series of production processes for substrates, image collectors each associated with a different one of the production processes upstream to the reflow process and an image display device for receiving images from the inspection device and the image collector and displaying the received images. The inspection device inspects a specified number of substrates to obtain measured values and calculates a margin for each component with respect to a specified reference value and transmits to the image collectors and the image display device the component code of the component with a small margin value. The image collectors save the image corresponding to the component code from the inspection device. The image display device receives images of the component corresponding to the component code from the inspection device and the image collectors and display images of the same component and the same substrate at each process.
申请公布号 US7672501(B2) 申请公布日期 2010.03.02
申请号 US20060517651 申请日期 2006.09.08
申请人 OMRON CORPORATION 发明人 MINAKATA TAKU;FUJII YOSHIKI
分类号 G06K9/00;G01N21/00 主分类号 G06K9/00
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