发明名称 Exhaust system for a vacuum processing system
摘要 A method, computer readable medium, and system for treating a substrate in a process space of a vacuum processing system is described. A vacuum pump in fluid communication with the vacuum processing system and configured to evacuate the process space, while a process material supply system is pneumatically coupled to the vacuum processing system and configured to supply a process gas to the process space. Additionally, the vacuum pump is pneumatically coupled to the process supply system and configured to, at times, evacuate the process gas supply system.
申请公布号 US7670432(B2) 申请公布日期 2010.03.02
申请号 US20060369754 申请日期 2006.03.08
申请人 TOKYO ELECTRON LIMITED 发明人 LI YICHENG
分类号 C23C16/505;H01L21/363 主分类号 C23C16/505
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