发明名称 |
SiGe device with SiGe-embedded dummy pattern for alleviating micro-loading effect |
摘要 |
A semiconductor device with dummy patterns for alleviating micro-loading effect includes a semiconductor substrate having thereon a middle annular region between an inner region and an outer region; a SiGe device on the semiconductor substrate within the inner region; and a plurality of dummy patterns provided on the semiconductor substrate within the middle annular region. At least one of the dummy patterns contains SiGe.
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申请公布号 |
US7671469(B2) |
申请公布日期 |
2010.03.02 |
申请号 |
US20070967264 |
申请日期 |
2007.12.31 |
申请人 |
MEDIATEK INC. |
发明人 |
LEE TUNG-HSING;YANG MING-TZONG;CHENG TAO;KO CHING-CHUNG;CHANG TIEN-CHANG;CHANG YU-TUNG |
分类号 |
H01L23/52 |
主分类号 |
H01L23/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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