发明名称 |
Cross hatched metrology marks and associated method of use |
摘要 |
The present invention is directed to novel metrology marks and methods for their use. The marks comprise cross hashed overlay metrology marks formed on a substrate including a plurality of target regions. The mark including a first grating structure formed in one layer of a target region and including a second grating structure formed in another layer of the target region. The periodic features of the first and second grating structures are oriented substantially orthogonal one another to form a cross-hatched metrology target in the target region. Additionally, the patent discloses methods of employing the metrology marks to obtain overlay metrology measurements.
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申请公布号 |
US7671990(B1) |
申请公布日期 |
2010.03.02 |
申请号 |
US20070759183 |
申请日期 |
2007.06.06 |
申请人 |
KLA-TENCOR TECHNOLOGIES CORPORATION |
发明人 |
ADEL MICHAEL E.;LEVINSKI VLADIMIR;KASSEL ELYAKIM |
分类号 |
G01B11/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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