发明名称 |
METHOD, DEVICE, AND BASE MATERIAL FOR MANUFACTURING POLYIMIDE FILM WITH PATTERN FORMED THEREON |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polyimide film with highly flat and precise pattern formed thereon. Ž<P>SOLUTION: A method for manufacturing the polyimide film with one pattern formed thereon includes: a process for forming a polyimide precursor layer on a base material 10; a pattern forming process for forming patterns of the polyimide precursor layer; a heating process for forming polyimide resin layers 16 by heating the polyimide precursor layer with the pattern formed thereon; and a separating process for separating the polyimide resin layers 16 from the base material 10 by contacting a solution 62 including hydrofluoric acid with the base material 10 and the polyimide resin layers 16. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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申请公布号 |
JP2010042644(A) |
申请公布日期 |
2010.02.25 |
申请号 |
JP20080210010 |
申请日期 |
2008.08.18 |
申请人 |
YAMANAKA SEMICONDUCTOR KK |
发明人 |
ANDO HAKUKEI;NAKANISHI AKINORI;KITAI NORIHIRO |
分类号 |
B29C41/12;B29K79/00;B29L7/00;C08J5/18 |
主分类号 |
B29C41/12 |
代理机构 |
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