| 摘要 |
PROBLEM TO BE SOLVED: To provide a composition for nanoimprint that is excellent in mold peeling performance and dry etching resistance. SOLUTION: The composition for nanoimprint includes at least one sort of (A) a polymerizable monomer (Ax) having an aromatic group and a phloroalkyl group and (B) a photopolymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT
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