| 摘要 |
Embodiments of a pellicle, methods of fabrication and methods of use in extreme ultraviolet (EUV) photolithography are disclosed. The pellicle may include a wire mesh with a square or hexagonal geometric configuration. A thin film of a material with a high Young's modulus may be coated on at least one surface of the wire mesh. A method of fabrication may include forming at least one sacrificial layer on a surface of the wire mesh, forming a thin film on another surface of the wire mesh, and removing the sacrificial layer to form a pellicle. A method of use may include positioning a pellicle relative to a photomask to protect the photomask from particulate accumulation during an EUV photolithography process.
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