| 摘要 |
A polishing method capable of reducing any concave defects of glass substrate for use in, for example, a reflective mask for EUVL. There is disclosed a method of polishing a glass substrate through polishing of the major surface of the glass substrate while feeding a polishing slurry into the interspace between the glass substrate and a pad surface of polishing pad, characterized in that the polishing load by the polishing pad is in the range of 1 to 60 g/cm. Preferably, the polishing pad has a pad surface dressing wrought. |
