发明名称 MEASUREMENT CONDITION OPTIMIZATION METHOD AND METHOD OF CREATING PROGRAM, AND ALIGNER
摘要 <P>PROBLEM TO BE SOLVED: To optimize measurement conditions of an efficient EGA sample mark. <P>SOLUTION: In measurement conditions of a sample mark used by enhanced global alignment (EGA), illumination conditions important for capturing an image signal of the mark are first optimized (step 206), and other measurement conditions are optimized under the optimized illumination conditions (step 208), thus suppressing the occurrence frequency of redoing of optimization. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2010040632(A) 申请公布日期 2010.02.18
申请号 JP20080199460 申请日期 2008.08.01
申请人 NIKON CORP 发明人 MIZUTANI SHINJI
分类号 H01L21/027 主分类号 H01L21/027
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