发明名称 IMAGE SENSOR AND METHOD FOR MANUFACTURING THEREOF
摘要 PURPOSE: An image sensor and a method for manufacturing thereof are provided to prevent the decline of sensitivity and saturation by making a path for a photo charge through a charge connection area. CONSTITUTION: A readout circuit(120) and an interlayer dielectric layer(160) are formed in a first substrate(100). A wiring is formed an interlayer dielectric layer and is electrically connected to the readout circuit. An image sensing device(210) is formed on the bottom electrode(205). The image sensing device comprises a first conductive layer, an intrinsic layer, and a second conductive layer. A pixel dielectric isolation layer(207) is formed on the image sensing device as much as the height of the first conductive layer.
申请公布号 KR20100012646(A) 申请公布日期 2010.02.08
申请号 KR20080074156 申请日期 2008.07.29
申请人 DONGBU HITEK CO., LTD. 发明人 JUN, SUNG HO
分类号 H01L27/146 主分类号 H01L27/146
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