| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus highly accurately executing exposure processing by stably forming a liquid immersion region and excellently recovering the liquid in executing exposure processing in a state where the liquid immersion region is formed between a projection optical system and a substrate, and by preventing outflowing or scattering of the liquid to the periphery. <P>SOLUTION: The exposure apparatus exposes a substrate by projecting an image of predetermined pattern onto the substrate via the liquid. The exposure apparatus is provided with: a projection optical system for projecting an image of pattern onto the substrate; a liquid supplying mechanism for supplying a liquid onto the substrate to form a liquid immersion region on a part of the substrate including the projection region of the projection optical system; and a liquid recovering mechanism for simultaneously recovering the liquid on the substrate at a plurality of positions spaced in a plurality of directions for the projection region. <P>COPYRIGHT: (C)2010,JPO&INPIT |
