LITHOGRAPHY SIMULATION DEVICE, LITHOGRAPHY SIMULATION PROGRAM, AND METHOD FOR DESIGNING AND MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a lithography simulation device for deciding the quality of a circuit layout or a mask pattern created therefor from various aspects, and to provide a lithography simulation program and a method for designing and manufacturing a semiconductor device using the device.

SOLUTION: A variation calculation section 44 outputs a variation on the basis of a variation model function. The variation is an index showing the size and deviation in a statistic distribution of a status values such as an edge position. An existence probability generating section 40 outputs Contour showing a finished pattern shape on a wafer on the basis of the simulation result. The existence probability generating section 40 outputs a distribution function that represents a variation degree of the finished pattern shape on the basis of the simulation result stored in a simulation result storing section 46.

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