发明名称 A RAPID THERMAL PROCESSING APPARATUS FOR LARGE-AREA
摘要 PURPOSE: A rapid thermal processing apparatus for a large-area is provided to increase the heat uniformity of a workpiece by installing a stick lamp inside a quartz tube and supplying uniform heat to a large scale on the workpiece. CONSTITUTION: A chamber has two holes opposite to each other, and the two holes penetrate a side of the chamber. A quartz tube(120) is inserted into ends of two holes. A stick type lamp(130) is inserted into the quartz tube. A lamp guide is formed with a head unit and a body. The head unit of the disc type has an outer diameter bigger than the diameter of the hole. The body comprises a communicating path for interlinking the quartz tube and the outside.
申请公布号 KR20100010770(A) 申请公布日期 2010.02.02
申请号 KR20080071804 申请日期 2008.07.23
申请人 SNTEK CO., LTD. 发明人 AN, KYOUNG JOON;JOUNG, SOUNG HUN;JANG, HYO JIN;LEE, SANG HEON
分类号 H01L21/324 主分类号 H01L21/324
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