发明名称 |
A RAPID THERMAL PROCESSING APPARATUS FOR LARGE-AREA |
摘要 |
PURPOSE: A rapid thermal processing apparatus for a large-area is provided to increase the heat uniformity of a workpiece by installing a stick lamp inside a quartz tube and supplying uniform heat to a large scale on the workpiece. CONSTITUTION: A chamber has two holes opposite to each other, and the two holes penetrate a side of the chamber. A quartz tube(120) is inserted into ends of two holes. A stick type lamp(130) is inserted into the quartz tube. A lamp guide is formed with a head unit and a body. The head unit of the disc type has an outer diameter bigger than the diameter of the hole. The body comprises a communicating path for interlinking the quartz tube and the outside.
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申请公布号 |
KR20100010770(A) |
申请公布日期 |
2010.02.02 |
申请号 |
KR20080071804 |
申请日期 |
2008.07.23 |
申请人 |
SNTEK CO., LTD. |
发明人 |
AN, KYOUNG JOON;JOUNG, SOUNG HUN;JANG, HYO JIN;LEE, SANG HEON |
分类号 |
H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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