发明名称 Bright nickel plating - using non-porous (semi) bright underlying lay
摘要 <p>A smooth, non-porous underlying layer (I) is formed before deposition of the Ni layer, so that a bright Ni layer can be rapidly and directly produced. The layer (I) may be of Ni, Cu, Sn, Zn, etc. Use of brightening agents which produce porous coatings is thus avoided.</p>
申请公布号 FR2085457(A3) 申请公布日期 1971.12.24
申请号 FR19700014728 申请日期 1970.04.20
申请人 DEBUCHY OCTAVE 发明人
分类号 C25D5/12;(IPC1-7):23B5/00 主分类号 C25D5/12
代理机构 代理人
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