PLASMA PROCESSING APPARATUS

摘要

A plasma processing apparatus for processing a substrate by use of plasma.  The plasma processing apparatus comprises a processing container; a mounting stage which is located in the processing container and on which a substrate is mounted; a gas shower head comprising a conductive member which is opposed to the mounting stage and the lower surface of which has a multiplicity of gas discharging apertures for supplying a processing gas into the processing container; an induction coil to which a high frequency current is supplied so as to generate an inductive coupling plasma in a region surrounding a space below the gas shower head; a negative voltage supplying means for applying a negative DC voltage to the gas shower head so as to lead an electrical field, which is inducted by the induction coil, to a central portion of the processing region; and a means for evacuating the processing container.