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发明名称
Präzise Strukturierung von Schichten mit hoher Dielektrizitätskonstante
摘要
申请公布号
DE602004024355(D1)
申请公布日期
2010.01.14
申请号
DE200460024355T
申请日期
2004.07.23
申请人
INTEL CORPORATION
发明人
BRASK, JUSTIN K.;DOCZY, MARK L.;METZ, MATTHEW V.;BARNAK, JOHN;MARKWORTH, PAUL R.
分类号
H01L21/3063;H01L21/311;H01L21/28
主分类号
H01L21/3063
代理机构
代理人
主权项
地址
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