| 摘要 |
PROBLEM TO BE SOLVED: To provide a surface treatment apparatus which prevents treatment unevenness and stably deposits a satisfactory film, and a surface treatment method. SOLUTION: The surface treatment method comprises a surface treatment process where a silane coupling agent Y1 is vaporized under pressure lower than atmospheric pressure, and a substrate W having an inorganic film 10 is exposed to the atmosphere of the vaporized silane coupling agent Y2 so as to deposit the film of the silane coupling agent on the inorganic film 10. Further, the surface treatment apparatus 1 is used for the surface treatment method, and comprises: a treatment agent vaporizing apparatus 21 vaporizing the silane coupling agent Y1; a gas supplying apparatus 22 supplying a carrier gas to the treatment agent vaporizing apparatus 21; a film deposition chamber 3 in which the substrate W having the inorganic film 10 is disposed and to which the vaporized silane coupling agent Y2 is supplied; and a pump 5 reducing the pressure in the film deposition chamber 3. COPYRIGHT: (C)2010,JPO&INPIT
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