| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device in which uniform plasma is generated by forming streamer discharge stably, and further, upsizing and cost increase of the device is suppressed. <P>SOLUTION: A plasma generating gas G is supplied to an opposed region 2 formed between a pair of opposed electrodes 1, 1. By applying a voltage between the electrodes 1, 1 under atmospheric pressure or under the pressure near it, streamer discharge S is formed in the opposed region 2 and, by this streamer discharge S, plasma P is generated in the opposed region 2. The plasma processing device to supply this plasma P to a treating object H is provided. The device is provided with a streamer discharge forming means to form the streamer discharge S by generating a non-uniform electric field intensity distribution in the opposed region, a streamer discharge dispersion means to disperse the streamer discharge S in the opposed region 2, and a transfer means to transfer the treating object H in the opposite region 2. <P>COPYRIGHT: (C)2010,JPO&INPIT |
