发明名称 Photosensitive resin composition, photosensitive layer using the same and photosensitive resin printing original plate
摘要 The present invention is to obtain without any trouble a photosensitive resin composition, a photosensitive layer and a photosensitive resin printing original plate, which are developable with an aqueous developer, resistant to an aqueous ink and a cosolvent ink, and assured of good image reproducibility. The present invention relates to a photosensitive resin composition comprising (A) hydrophobic polymers obtained from at least two or more water dispersion latexes, (B) a photopolymerizable compound and (C) a photopolymerization initiator, wherein the two or more hydrophobic polymers each is present in a fine particle state.
申请公布号 US7645563(B2) 申请公布日期 2010.01.12
申请号 US20040552596 申请日期 2004.04.07
申请人 TOYO BOSEKI KABUSHIKI KAISHA 发明人 WADA TORU;HIRAMATSU TOMONORI;TOMITA AKIRA
分类号 G03F7/033 主分类号 G03F7/033
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