发明名称 |
SEMICONDUCTOR ELEMENT, AND SEMICONDUCTOR SUBSTRATE |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a semiconductor element having a gate pattern disposed below a body region, and to provide a semiconductor substrate. <P>SOLUTION: A semiconductor element 300 includes the semiconductor substrate 310, the gate pattern 330 disposed on the semiconductor substrate 310, the body region 370 disposed on a gate insulating region 360 on the gate pattern 330, and a first impurity doping region 340 and a second impurity doping region 350 disposed on the body region 370. A shield insulating region 380 is disposed between the first impurity doping region 340 and the second impurity doping region 350. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
申请公布号 |
JP2010004046(A) |
申请公布日期 |
2010.01.07 |
申请号 |
JP20090147981 |
申请日期 |
2009.06.22 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
CHA DAE-KIL;KIM WON-JOO;LEE TAKI;PARK YOON-DONG |
分类号 |
H01L21/8242;H01L27/108;H01L29/786 |
主分类号 |
H01L21/8242 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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