发明名称 DEPOSITION SOURCE, FILM FORMING APPARATUS AND FILM FORMING METHOD
摘要 PURPOSE: A deposition source, a film forming apparatus, and a film forming method are provided to manufacture a liquid crystal display and form an organic film. CONSTITUTION: A deposition source comprises a material container(200), a heating member(105), a pressing member(115) and an elastic member. The container contains materials. The heating member heats the material accepted in the material container. The pressing member has a flat board in which a plurality of through-holes are formed. A pressing surface of the flat board presses the material accepted in the material container. The pressing member passes the material particles vaporized with the heating of the upper heating member through the through-holes. The elastic member releases the pressure of the pressing member on the material.
申请公布号 KR20100002078(A) 申请公布日期 2010.01.06
申请号 KR20090022100 申请日期 2009.03.16
申请人 TOKYO ELECTRON LIMITED 发明人 IKUTA HIROYUKI;SUDOU KENJI;FUKIAGE NORIAKI;EDURA TOMOHIKO;KAMADA TOYOHIRO
分类号 C23C14/24;C23C14/12;H05B33/10;H05B33/14 主分类号 C23C14/24
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