发明名称 |
METHOD FOR PRODUCING TRICHLOROSILANE AND APPARATUS FOR PRODUCING TRICHLOROSILANE |
摘要 |
An apparatus comprising: a reaction chamber 2 into which silicon tetrachloride and hydrogen is introduced for producing a reaction product gas containing trichlorosilane and hydrogen chloride by a reductive reaction at a temperature of not lower than 800° C.; a reaction product gas discharging device 4 that discharges the reaction product gas in the reaction chamber 2 to the outside; a cooling gas introducing device 5 that mixes hydrogen, silicon tetrachloride, or hydrogen chloride in the reaction product gas being discharged by the reaction product gas discharging device 4 to cool the reaction product gas.
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申请公布号 |
US2009324477(A1) |
申请公布日期 |
2009.12.31 |
申请号 |
US20070309627 |
申请日期 |
2007.10.26 |
申请人 |
MITSUBISHI MATERIALS CORPORATION |
发明人 |
MIZUSHIMA KAZUKI;URUSHIHARA MAKOTO |
分类号 |
C01B33/107;F28D5/00;F28D21/00 |
主分类号 |
C01B33/107 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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