发明名称 |
Resist composition and pattern-forming method using same |
摘要 |
<p>A resist composition comprises (A) at least two kinds of resins each of which decomposes by the action of an acid to undergo an increase in its solubility for an alkali developer, wherein at least one kind of the resins (A) is a resin synthesized by living radical polymerization using a chain transfer agent represented by formula (I): wherein: A represents an organic group not containing hetero atoms; and Y represents an organic group capable of releasing a radical.</p> |
申请公布号 |
EP1972641(A3) |
申请公布日期 |
2009.12.30 |
申请号 |
EP20080005504 |
申请日期 |
2008.03.25 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KAMIMURA, SOU;KANEKO, YUSHI |
分类号 |
C08F2/38;G03F7/039 |
主分类号 |
C08F2/38 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|