发明名称 Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices
摘要 A film forming apparatus which forms a film on a substrate by utilizing a chemical solution, including: a correlation data creating unit which creates a correlation data that is related to the quality of a chemical solution, from data that is related to the properties of the chemical solution including at least one of data on storage temperature for the chemical solution to be loaded and data on pressure applied to the chemical solution to be loaded; and a determining unit which determines whether or not the chemical solution holds expected quality thereof on the bases of the correlation data.
申请公布号 US7638001(B2) 申请公布日期 2009.12.29
申请号 US20050123093 申请日期 2005.05.06
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KAWAMURA DAISUKE
分类号 B05C5/02;H01L21/31;B05C11/00;B05D1/26;B05D3/00;H01L21/316 主分类号 B05C5/02
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