| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a material pattern capable of forming a pattern with a complicated shape in a simple method. SOLUTION: The manufacturing method of the material pattern includes a step for forming resist layers 11a, 11b having the same pattern as the material pattern which is desired to be formed on a Si based or metallic substrate 10, a step for forming a fluorocarbon layer 12 chemically bonded with the surface of the substrate on the substrate 10 where the resist layers 11a, 11b are formed, a step for forming the fluorocarbon layer 12 having a negative pattern to the material pattern desired to be formed by removing the resist layers 11a, 11b, and a step for forming the material pattern on the substrate with the fluorocarbon layer 12 having the negative pattern as a mask. COPYRIGHT: (C)2010,JPO&INPIT
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