发明名称 PROXIMITY EXPOSURE APPARATUS AND SUBSTRATE CONVEYANCE METHOD IN PROXIMITY EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To convey a substrate to a chuck so as to prevent two side edges perpendicular to each other of the substrate from being out of the view range of an image acquiring device for preliminary alignment. <P>SOLUTION: A substrate 1 prior to being conveyed to a chuck 10 is mounted on a cooling plate 40 and cooled. Positions of two side edges perpendicular to each other of the substrate 1 are detected to detect shift amounts of the position in XY directions and of the angle in a &theta; direction of the substrate 1 mounted on the cooling plate 40. Before the substrate 1 is conveyed to the chuck 10, the chuck 10 is moved in the XY directions and rotated in the &theta; direction by the shift amounts of the position in the XY directions and of the angle in the &theta; direction of the substrate 1 mounted on the cooling plate 40. The substrate 1 is then conveyed from the cooling plate 40 to the chuck 10. After the substrate is conveyed and before the image acquiring device for preliminary alignment acquires an image of the two side edges perpendicular to each other of the substrate 1, the positions in the XY directions and the rotation in the &theta; direction of the chuck 10 are returned to the original state. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009300972(A) 申请公布日期 2009.12.24
申请号 JP20080158330 申请日期 2008.06.17
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 YAMANAKA KEISUKE;MORI JUNICHI
分类号 G03F9/00;H01L21/677;H01L21/68 主分类号 G03F9/00
代理机构 代理人
主权项
地址