SUSCEPTOR UNIT, APPARATUS FOR MANUFACTURING SEMICONDUCTOR HAVING THE SUSCEPTOR AND DRY ETCH METHOD FOR SILICON OXIDE USING THE APPARATUS

摘要

PURPOSE: A susceptor unit, an apparatus for manufacturing a semiconductor having the susceptor and a dry etch method for silicon oxide using the apparatus are provided to minimize contamination of a substrate by reducing the number of transferring the substrate. CONSTITUTION: In a device, a susceptor unit for a semiconductor manufacturing includes a susceptor(20) and a heater(30) supporting substrate. The susceptor and heater are transferred between them. Heater includes the support supporting substrate. The support is located in the first location arranged on a first position of the susceptor. The support is selectively located on a second position. The substrate is heated in the first position. An insertion hole(23) is formed in the susceptor.