| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing tool capable of efficiently performing stable mirror finishing. Ž<P>SOLUTION: This polishing tool 10 uses, as an abrasive material, a plurality of secondary particles 12 within the range of more than 30 μm to equal to or less than 300 μm, desirably within the range of 40-100 μm in average grain diameter, which are formed by coagulating fine primary particles 11 such as colloidal silica or ultrafine zirconia. The plurality of secondary particles 12 are fixed onto a substrate 16 with a bond 18 with a part of the secondary particles exposed from the surface of the bond 18 to the outside. Since the state of the secondary particles projecting from the surface of the bond at all times can be maintained and chips can be well removed, the stable mirror finishing can be efficiently performed. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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