PAINT FOR FORMING POROUS METAL OXIDE SEMICONDUCTOR FILM FOR PHOTOELECTRIC CELL, AND PHOTOELECTRIC CELL

摘要

PROBLEM TO BE SOLVED: To provide a paint for forming a porous metal oxide semiconductor film for photoelectric cell in which the porous metal oxide semiconductor film for photoelectric cell of a uniform thickness can be formed with a small number of times.

SOLUTION: The photoelectric cell has a substrate 5 which has an electrode layer 1 on the surface, has a titanium oxide thin film 7 on the electrode layer 1, and a porous metal oxide semiconductor film 2 adsorbing a photosensitize material formed on the titanium oxide thin film 7 and a substrate 6 which has an electrode layer 3 on the surface arranged so that the electrode layer 1 and the electrode layer 3 may be facing each other, an electrolyte is filled between the porous metal oxide semiconductor film 2 and the electrode layer 3. The paint for forming the semiconductor film contains a porous titanium oxide particulate aggregate of which the average particle size is in the range 0.5-10 μm and the pore volume is in the range 0.1-0.8 ml/g and a non-aggregate titanium oxide particulate of which the average particle size is in the range 5-400 nm.

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