发明名称 |
Methods for fabricating isolated micro- and nano- structures using soft or imprint lithography |
摘要 |
The presently disclosed subject matter describes the use of fluorinated elastomer-based materials, in particular perfluoropolyether (PFPE)-based materials, in high-resolution soft or imprint lithographic applications, such as micro- and nanoscale replica molding, and the first nano-contact molding of organic materials to generate high fidelity features using an elastomeric mold. Accordingly, the presently disclosed subject matter describes a method for producing free-standing, isolated nanostructures of any shape using soft or imprint lithography technique. |
申请公布号 |
AU2004318602(B2) |
申请公布日期 |
2009.12.10 |
申请号 |
AU20040318602 |
申请日期 |
2004.12.20 |
申请人 |
THE UNIVERSITY OF NORTH CAROLINA AT CHAPEL HILL |
发明人 |
GINGER M. DENISON;JASON P. ROLLAND;EDWARD T. SAMULSKI;R. JUDE SAMULSKI;JOSEPH M. DESIMONE;BENJAMIN W. MAYNOR;LARKEN E. EULISS;ANSLEY E. EXNER |
分类号 |
H01L21/302;A61K9/00;A61K9/51;B81C99/00;G03F7/00;H01L21/02;H01L51/00;H01L51/40 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|