发明名称 |
EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH RESONANT BARRIER LAYER |
摘要 |
The invention relates to extreme ultraviolet photolithography masks that operate in reflection. These masks comprise a lower mirror covering a substrate, and two types of reflecting zones Z1 and Z2 in order to form a phase shift mask. An etch stop layer is interposed between the lower mirror and an upper reflective structure. This layer has a thickness such that it behaves like a reflective resonant cavity surrounded by the upper and lower reflective structures.
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申请公布号 |
US2009305147(A1) |
申请公布日期 |
2009.12.10 |
申请号 |
US20070295952 |
申请日期 |
2007.04.02 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE |
发明人 |
CONSTANCIAS CHRISTOPHE |
分类号 |
G03F1/00 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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