发明名称 A MONITORING SYSTEM BASED ON ETCHING OF METALS
摘要 Compositions, devices and processes related to etching of a very thin layer or fine particles of a metal are disclosed for monitoring a variety of parameters, such as time, temperature, time-temperature, thawing, freezing, microwave, humidity, ionizing radiation, sterilization and chemicals These devices have capabilities of producing a long and sharp induction pepod of an irreversible visual change The devices are composed of an indicator comppsing a very thin layer of a metal (e g, polyester film having an extremely thin, e g, about one hundred Angstroms layer of aluminum) and an activator, e g, a reactant, such as water, water vapor, an acid, a base, oxidizing agent or their precursors, which is capable of reacting with the said indicator The indicator retains its opacity and metallic luster, e g, silvery white, mirror like finish of aluminum layer for a long time The activator destroys the indicator layer including the naturally formed oxide layer
申请公布号 WO2009149243(A1) 申请公布日期 2009.12.10
申请号 WO2009US46228 申请日期 2009.06.04
申请人 PATEL, G 发明人 PATEL, G
分类号 G01D21/00 主分类号 G01D21/00
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