发明名称 |
Low-expansion glass substrate for a reflective mask and reflective mask |
摘要 |
A low-expansion glass substrate for a reflective mask, wherein the glass substrate is suited for a base material of a reflective mask employed in a lithographic process in semiconductor fabrication, comprises a lateral surface, a chamfered portion and a notched portion formed along an outer periphery thereof, at least one of the lateral surface, the chamfered portion and the notched portion being provided with a mirror-finished surface.
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申请公布号 |
US7629089(B2) |
申请公布日期 |
2009.12.08 |
申请号 |
US20060519078 |
申请日期 |
2006.09.12 |
申请人 |
ASAHI GLASS COMPANY, LIMITED |
发明人 |
ITO MASABUMI;MISHIRO HITOSHI |
分类号 |
G03F1/00;B32B9/00;G03F1/14;G03F1/24;G03F7/20 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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