发明名称 |
ORGANIC SILICON OXIDE FINE PARTICLES AND PREPARATION METHOD THEREOF, POROUS FILM-FORMING COMPOSITION, POROUS FILM AND FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE |
摘要 |
Provided are organic silicon oxide fine particles which can be formed into a porous film having a dielectric constant and mechanical strength expected as a high-performance porous insulating film and having excellent chemical stability, and a preparation method thereof. Described specifically, provided are an organic silicon oxide fine particle comprising a core containing at least an inorganic silicon oxide or an organic silicon oxide and a shell containing at least an organic silicon oxide and being formed around the core by using shell-forming hydrolyzable silane in the presence of a basic catalyst; wherein of silicon atoms constituting the core or the shell, a ratio (T/Q) of a number (T) of silicon atoms having at least one bond directly attached to a carbon atom to a number (Q) of silicon atoms having all of four bonds attached to an oxygen atom is greater in the shell than in the core; and wherein the shell-forming hydrolyzable silane comprise at least a hydrolyzable silane compound having two or more hydrolyzable-group-having silicon atoms bound to each other via a carbon chain or via a carbon chain containing one silicon atom between some carbon atoms.
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申请公布号 |
US2009294726(A1) |
申请公布日期 |
2009.12.03 |
申请号 |
US20090472681 |
申请日期 |
2009.05.27 |
申请人 |
HAMADA YOSHITAKA;YAGIHASHI FUJIO;ASANO TAKESHI;NAKAGAWA HIDEO;SASAGO MASARU |
发明人 |
HAMADA YOSHITAKA;YAGIHASHI FUJIO;ASANO TAKESHI;NAKAGAWA HIDEO;SASAGO MASARU |
分类号 |
B32B1/00;B29C35/02;B29C35/08;C09K3/00 |
主分类号 |
B32B1/00 |
代理机构 |
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代理人 |
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地址 |
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