发明名称 |
PLASMA GENERATING APPARATUS AND PLASMA PROCESSING APPARATUS |
摘要 |
<p>A flat-board-like high frequency antenna conductor (13) is arranged on a flange, which also serves as a part of a vacuum container and has a rectangular opening section, so as to cover the opening section by sandwiching an insulating glass frame body surrounding the opening section. A high frequency power supply is connected to the high frequency antenna conductor at one end thereof along the long side, with a matching box therebetween, and the other end is grounded, then, power is supplied so that a high frequency current flows from the one end to the other end of the high frequency antenna conductor. Thus, impedance of the high frequency antenna conductor is reduced and high density plasma at a low electron temperature can be efficiently generated.</p> |
申请公布号 |
WO2009142016(A1) |
申请公布日期 |
2009.11.26 |
申请号 |
WO2009JP02234 |
申请日期 |
2009.05.21 |
申请人 |
EMD CORPORATION;EBE, AKINORI;ANDO, YASUNORI;WATANABE, MASANORI |
发明人 |
EBE, AKINORI;ANDO, YASUNORI;WATANABE, MASANORI |
分类号 |
H05H1/46;C23C16/507;H01L21/3065 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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