发明名称 METHOD OF MANUFACTURING SUBSTRATE FOR POLISHING OBJECT HOLDING MATERIAL, AND SUBSTRATE FOR POLISHING OBJECT HOLDING MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To obtain a substrate for a polishing object holding material, which is restrained in warping and formed into a flat plate to the possible extent. <P>SOLUTION: In manufacturing the substrate, a resin material 5 made of a cycloolefin-based polymer resin is pinched between two press plates 3, 4 arranged in parallel with each other, and then pressurized, followed by heating the same to a predetermined heating temperature. Thereafter the resin material is cooled while being pressurized. At the time when the resin material is cooled to a predetermined cooling temperature or lower, the pressurization state of the resin material is released. <P>COPYRIGHT: (C)2010,JPO&INPIT
申请公布号 JP2009274150(A) 申请公布日期 2009.11.26
申请号 JP20080125565 申请日期 2008.05.13
申请人 KAWAMURA SANGYO KK;FUJI BEEKURAITO KK;TOYO PLASTIC SEIKO CO LTD 发明人 YOKURA MITSUYOSHI;KATO SHOJI;SHIRAGA JUN;SENOO RYUJI;BABA MANABU;MIZUTANI HITOSHI
分类号 B24B37/27;B24B37/28 主分类号 B24B37/27
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