发明名称 SURFACE PROCESSING SYSTEM FOR SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To provide a small surface processing system for substrate in which installation space is reduced and utilization of work space is enhanced. SOLUTION: A substrate cleaning section 20 in which a substrate requiring surface processing is pulled out from a cassette and held by means of a chuck 21, processing liquid is supplied to its surface through a liquid supply opening communicating with a dispenser 24 and dried before the substrate is restocked in the cassette, and a processing liquid processing section 30 arranged to control supply and collection of processing liquid stored in a liquid storage tank 31 communicating with the dispenser are located at upper and lower parts in the same section. COPYRIGHT: (C)2006,JPO&NCIPI
申请公布号 JP2006157005(A) 申请公布日期 2006.06.15
申请号 JP20050338294 申请日期 2005.11.24
申请人 KAIJO CORP 发明人 KIM DOKUHO;LEE WANKI;KIM DEHI;KIM KIJO;PARK HYONSU;YU BYONCHURU;KIM KUNU
分类号 H01L21/304;H01L21/306 主分类号 H01L21/304
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