Electrical connection structure for magnetic heads and method for making the same

摘要

An electrically conductive etch stop layer is formed over a first electrically conductive layer. An electrically conductive diffusion barrier layer is then formed over the etch stop layer, followed by the formation of an insulator layer over the diffusion barrier layer. Utilizing an etching process with a patterned photoresist in place, insulator materials in a central region are removed to form a via which exposes electrically conductive materials in the central region. Finally, a second electrically conductive layer is formed within the via over the electrically conductive materials in the central region.