| 摘要 |
PURPOSE: A thin film forming device is provided to reduce processing time, and to simplify forming processes of a thin film by equipping a plurality of chambers efficiently. CONSTITUTION: A thin film forming device(1) includes an unwinding chamber(10), a processing chamber, and a rewinding chamber(40). The unwinding chamber feeds a base film(F1). The processing chamber forms a thin film on both sides of the base film. The rewinding chamber winds an evaporation film(F3) in which a thin film is formed. The processing chamber includes a first drum(21), a first thin film forming unit(22), a second drum(23), and a second thin film forming unit(24). A side of the base film is contacted with the first drum. The processing chamber includes a first processing chamber(20) forming a silicon dioxide thin film and a second processing chamber(30) forming an ITO thin film.
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