| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a circuit structure and a photomask for the circuit structure, the photomask pattern including lines and pickup pads that can be more easily corrected by OPC (optical proximity correction) than by conventional techniques. <P>SOLUTION: A circuit structure and a photomask for defining the circuit structure are provided. The circuit structure includes a plurality of pickup pads 320 and a plurality of lines 310 in parallel, in which a part of the lines contiguously arranged are each disposed with a pickup pad. The pickup pad of any line disposed with a pickup pad is connected, through a discontinuity point 330 of a neighboring line at one side of the line, to a next line. The photomask has thereon a plurality of line patterns for defining the above lines and a plurality of pickup pad defining patterns for defining the above pickup pads. <P>COPYRIGHT: (C)2010,JPO&INPIT</p> |
