| 摘要 |
<P>PROBLEM TO BE SOLVED: To avoid displacement of a measuring position before and after film formation in a thin film measurement method and a thin film measurement device using an ellipsometer. Ž<P>SOLUTION: A dimmer filter 15 is inserted between a laser light emission part 13 and a specimen 10 to determine the center of projection light of laser light on the surface of the specimen 10 and laser light is irradiated at a prescribed position. Thereafter, the dimmer filter 15 is retreated to measure a polarizing state of the surface of the specimen 10. Next, after a thin film is formed on the surface of the specimen 10, the dimmer filter 15 is inserted between the laser light emission part 13 and the specimen 10 to determine the center of the projection light of laser light on the surface of the specimen 10, and laser light is irradiated at the prescribed position. Thereafter, the dimmer filter 15 is retreated to measure the polarizing state of the surface of the specimen 10. Next, thickness of the thin film is obtained from change of the polarizing state before and after thin film formation. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž
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