| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithographic projection system in which thermal effects of optical elements in the radiation and/or projection systems on imaging quality are further reduced or eliminated. <P>SOLUTION: The invention relates to a lithographic apparatus comprising: an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein at least one component in the apparatus that in use experiences a heat load is provided with an integrally mounted heating element arranged to maintain the component at a substantially constant temperature. In this way, heating and cooling effects on the component are avoided. Further, due to the component being subject to reduced thermal gradients, less optical distortions are experienced. <P>COPYRIGHT: (C)2010,JPO&INPIT |
