发明名称 |
Physical vapor deposition target constructions |
摘要 |
The invention includes a target construction having a sputtering region and a flange region laterally outward relative to the sputtering region. The flange region has a front surface disposed on a front face of the construction and a back surface opposing the front surface. An o-ring groove is disposed within the flange region. The o-ring groove has a planar base surface which has a first width and has an orifice disposed along the front surface of the flange. The orifice has a second width as measured parallel relative to the base surface. The second width is greater than the first width. The flange surfaces can additionally be protected from rubbing by a layer of protective material.
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申请公布号 |
US7618520(B2) |
申请公布日期 |
2009.11.17 |
申请号 |
US20050234615 |
申请日期 |
2005.09.23 |
申请人 |
HONEYWELL INTERNATIONAL INC. |
发明人 |
WU CHI TSE;FERRASSE STEPHANE;ALFORD FRANK C.;GRABMEIER SUSANNE;HORT WERNER H.;KIM JAEYEON;STROTHERS SUSAN D.;WRAGG ANDREW;PRATER ROBERT |
分类号 |
C23C14/35;C23C14/34 |
主分类号 |
C23C14/35 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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