| 发明名称 |
LITHOGRAPHIC APPARATUS AND METHOD |
| 摘要 |
A substrate table is disclosed in which heaters are provided to account for a heat load which may be applied to the substrate. The heaters are grouped in segments to improve control. A temperature sensor per segment may be provided. The temperature sensor may be embedded in the substrate table.
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| 申请公布号 |
US2009279061(A1) |
申请公布日期 |
2009.11.12 |
| 申请号 |
US20090436635 |
申请日期 |
2009.05.06 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
JACOBS JOHANNES HENRICUS WILHELMUS;LEENDERS MARTINUS HENDRIKUS ANTONIUS;VAN DER MEULEN FRITS;OTTENS JOOST JEROEN;SIJBEN ANKO JOZEF CORNELUS;MARIA MAAS WOUTERUS JOHANNES PETRUS;VAN ABEELEN HENDRIKUS JOHANNES MARINUS;VERSTEIJNEN HENRICUS PETRUS;STEFFENS PAULA |
| 分类号 |
G03B27/52;G03B27/32 |
主分类号 |
G03B27/52 |
| 代理机构 |
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