ULTRAVIOLET RADIATION PROCESSING APPARATUS

摘要

<P>PROBLEM TO BE SOLVED: To provide an ultraviolet radiation processing apparatus capable of suppressing a decrease in the intensity of ultraviolet rays reaching the surface of an object to be treated and at the same time suppressing generation of static electricity on the surface of the object to be treated. Ž<P>SOLUTION: An ultraviolet radiation processing apparatus 20 cleans the surface of an object to be treated W by irradiating the object to be treated W that is transported with ultraviolet rays from a lamp house 30 equipped with an ultraviolet lamp 32 and includes a gas supply duct 37 for supplying a gas mixture obtained by mixing an inert gas and electron-affinitive molecules to the surrounding of the object to be treated W. The concentration of the electron-affinitive molecules in the gas mixture is preferably 1.0% or higher and 6.0% or lower. The inert gas is preferably nitrogen gas. The electron-affinitive molecules are preferably oxygen molecules. Ž<P>COPYRIGHT: (C)2010,JPO&INPIT Ž